REO offers non-polarizing beamsplitters

Feb. 17, 2011
A new series of cube beamsplitters from REO are designed for demanding DWDM applications in telecommunications. Optimized for use in Gires-Tournois interferometer based interleavers and dispersion compensators, REO says its non-polarizing beamsplitters deliver broadband, polarization-insensitive operation and “exceptional” path length matching for the reflected and transmitted beams.

A new series of cube beamsplitters from REO are designed for demanding DWDM applications in telecommunications. Optimized for use in Gires-Tournois interferometer based interleavers and dispersion compensators, REO says its non-polarizing beamsplitters deliver broadband, polarization-insensitive operation and “exceptional” path length matching for the reflected and transmitted beams. The devices consistently deliver the transmission and channel isolation characteristics required by demanding long-haul and metro network applications, the company adds.

Traditional non-polarizing beamsplitters are limited by either a narrow operating band or high internal absorption, according to REO. Conversely, REO says it avoids these drawbacks by employing all dielectric, ion beam sputtered (IBS) coatings and a high index of refraction contrast material set. The results are telecom C-band (1525–1570 nm) and L-band (1565–1620 nm) beamsplitters that deliver a transmission and reflection ratio of 50% ± 1.5% over their entire operating range, with the s and p polarization components matched to within 2%.

Furthermore, a series of high precision, proprietary fabrication techniques, together with the company’s Activated Covalent Bonding adhesive-free bonding process, enable the consistent production of cubes with an optical path difference between the two output beams of under 3 µm, together with sub arcminute beam deviation accuracy and low wavefront distortion (surface flatness λ/20 @ 633 nm), REO asserts.

The beamsplitters are available in the 3-mm to 12.5-mm size range, and are fabricated from fused silica substrates.

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